Effect of the oxygen non-stoichiometry on the damage threshold of the SiO2-δsystem optical coatings

Autor:	J. U. Zaporozhenko, N. A. Kalanda, S. A. Guretskii, C. D. Tushina, A. G. Mashchenko, U. P. Kutavichyus, A. M. Luginets
Rok vydání:	2005
Předmět:	Photoluminescence Optical coating Materials science chemistry Absorption edge Annealing (metallurgy) Analytical chemistry chemistry.chemical_element Partial pressure Atmospheric temperature range Oxygen Atomic and Molecular Physics and Optics Stoichiometry
Zdroj:	Journal of Modern Optics. 52:505-513
ISSN:	1362-3044 0950-0340
Popis:	The results of the coulometric study of the processes of oxygen sorption–desorption in optical coatings (OCs) of the SiO2- δ system deposited by the electron-beam sputtering technique are presented. The character of structural transformations occurring when the coatings under-go polythermal annealing within the temperature range from 200 to 1000°C and at oxygen partial pressures p O2=102–105 Pa has been established. It has been ascertained that the intensity of photoluminescence of the OCs and shift of the absorption edge depends on the annealing condition within the temperature range from 400 to 550°C in the dehydrated oxygen atmosphere that is caused by the coagulation of silicon atoms with their subsequent oxidization. The dependence of the optical damage thresholds of the SiO2- δ on structural defects has been studied.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::26fd4f89444a2616a7b235792dd66585 https://doi.org/10.1080/09500340410001705371 Zobrazit plný text záznamu