Characteristics of 2-photon ultraviolet laser etching of diamond
| Autor: | Richard P. Mildren, Andrew Lehmann, Adam Bramble, Benjamin F. Johnston, Leigh Weston, David J. Spence, Brown Joshua David, Eduardo Granados, James E. Downes |
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| Rok vydání: | 2011 |
| Předmět: |
Materials science
business.industry Diamond engineering.material medicine.disease_cause Laser Fluence XANES Electronic Optical and Magnetic Materials law.invention Optics Etching (microfabrication) law medicine engineering Optoelectronics Reactive-ion etching business Absorption (electromagnetic radiation) Ultraviolet |
| Zdroj: | Optical Materials Express. 1:576 |
| ISSN: | 2159-3930 |
| Popis: | We report graphite-free laser etching of diamond surfaces using 266 nm laser pulses for a wide range of incident fluences below the threshold for ablation. The etching rate is proportional to the (fluence)x where x = 1.88 ± 0.16 over the range 10−6 - 10−2 nm per pulse for incident pulse fluences 1 – 60 J/cm2. Surface sensitive near edge x-ray fine absorption structure measurements (partial electron yield NEXAFS) reveal that etching does not significantly alter the surface structure from the initial oxygen terminated and graphite-free state. The etching process, which is consistent with a mechanism involving the desorption of carbon species via the decay of 2-photon excited excitons near the surface, appears to have no threshold and is promising for creating a range of high resolution structures. |
| Databáze: | OpenAIRE |
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