Autor: |
M. Tallian, A. Pap, D. Kosztka, T. Pavelka, Jiro Matsuo, Masataka Kase, Takaaki Aoki, Toshio Seki |
Rok vydání: |
2011 |
Předmět: |
|
Zdroj: |
AIP Conference Proceedings. |
ISSN: |
0094-243X |
DOI: |
10.1063/1.3548445 |
Popis: |
Many state‐of‐the‐art techniques are used to create ultra shallow junctions, but they have a common side effect: the potential increase in the leakage current. This can heavily affect device performance, therefore it needs to be monitored carefully. Junction Photovoltage technique is suitable for the purpose. It is proven to work in a wide range of leakage currents, up to extremely high values. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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