Preparation of carbonitride films in the active and afterglow phases of a glow discharge

Autor:	G. M. Grigorian, Igor' V Kochetov
Rok vydání:	2013
Předmět:	Glow discharge Argon Materials science Physics and Astronomy (miscellaneous) Absorption spectroscopy Analytical chemistry chemistry.chemical_element Condensed Matter Physics law.invention Afterglow chemistry law Deposition (phase transition) Gas-filled tube Thin film Helium
Zdroj:	Plasma Physics Reports. 39:412-419
ISSN:	1562-6938 1063-780X
DOI:	10.1134/s1063780x1305005x
Popis:	The formation of carbonitride (CxNy) films in the active and afterglow phases of a glow discharge in CH4-N2 mixtures (as well in these mixtures diluted with argon and helium) was studied experimentally. The dependences of the film growth rate on the discharge current and gas pressure are obtained. The composition (the N/C ratio) and IR absorption spectra of the films are determined. Measurements of the absorption spectra made it possible to identify bonds between C and N atoms. A novel method of carbonitride film deposition in the “double afterglow” mode was proposed. The use of this method appreciably increases the film deposition rate. Possible mechanisms of the formation and destruction of carbonitride films in the active and afterglow phases of the discharge are discussed.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::26aa1e0be904e05d23770e7bdc27c900 https://doi.org/10.1134/s1063780x1305005x Zobrazit plný text záznamu Plný text ve formátu PDF