High-Remaining Dry-Developed Resist Patterns of Steep Profile

Autor:	Hisashi Nakane, Wataru Kanai, Minoru Tsuda, Ken-ichi Kashiwagi, Setsuko Oikawa, Akira Yokota, Mitsuo Yabuta
Rok vydání:	1983
Předmět:	Resist Chemistry General Engineering Analytical chemistry General Physics and Astronomy Organic chemistry Pure oxygen
Zdroj:	Japanese Journal of Applied Physics. 22:1215
ISSN:	1347-4065 0021-4922
DOI:	10.1143/jjap.22.1215
Popis:	A dry developable resist composition which gives a steep profile pattern and high-remaining resist thickness (ca. 90%) is described. The composition comprises poly (methyl isopropenyl ketone), PMIPK, and 4,4'-diazidodiphenyl sulfone. The resist patterns were developed by a well-controlled pure oxygen plasma. The exposure time was 3.6–6.0 sec for a deep UV contact printer and the development time required was 80 sec. A resolution of 0.5 µm of the steep-profiled lines was easily obtained. The photochemical reaction mechanism and some properties of the dry-developed resist pattern are discussed.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::266b64a165d1e98f5b9479d9f363e9af https://doi.org/10.1143/jjap.22.1215 Zobrazit plný text záznamu