X-ray reflectometry analyses of chromium thin films
| Autor: | M.S. Hatzistergos, E. Lifshin, Richard J. Matyi |
|---|---|
| Rok vydání: | 2006 |
| Předmět: |
Systematic error
business.industry Scanning electron microscope Metals and Alloys Analytical chemistry X-ray chemistry.chemical_element Surfaces and Interfaces Surfaces Coatings and Films Electronic Optical and Magnetic Materials X-ray reflectivity Chromium Optics chemistry Materials Chemistry Statistical error Thin film Reflectometry business |
| Zdroj: | Thin Solid Films. 515:1286-1293 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2006.03.016 |
| Popis: | A series of thin (less than 100 nm) chromium films on Si and SiO 2 /Si substrates has been examined using X-ray reflectometry (XRR) and cross-section scanning electron microscopy. Comparisons of the measured film thicknesses from the two disparate methods were in good agreement. Because of this accord, it was possible to use these chromium thin films as model systems in order to probe the impact of both random and systematic errors on quantitative XRR measurements. In general, the errors associated with common XRR operations such as sample placement, system alignment, and choice of an instrumental broadening characteristic were much smaller than the statistical error obtained from a genetic algorithm fitting process to the experimental XRR curve. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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