Glass nanoimprint using amorphous Ni–P mold etched by focused-ion beam
| Autor: | Harutaka Mekaru, Michiru Yamashita, Masaharu Takahashi, Takeshi Kitadani |
|---|---|
| Rok vydání: | 2007 |
| Předmět: |
Materials science
Metallurgy Alloy Surfaces and Interfaces Molding (process) engineering.material Condensed Matter Physics medicine.disease_cause Focused ion beam Surfaces Coatings and Films Amorphous solid Etching (microfabrication) Mold medicine engineering Wafer Composite material Layer (electronics) |
| Zdroj: | Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 25:1025-1028 |
| ISSN: | 1520-8559 0734-2101 |
| Popis: | The authors succeeded in glass-nanoimprint lithography of micropatterns and nanopatterns using an amorphous Ni–P alloy mold. Glasslike carbon has been used as a mold material to mold not only Pyrex glass but also quartz, because it is still stable at a temperature of 1650°C. However, it is difficult to process glasslike carbon substrates into arbitrary shapes by machining. They thought that amorphous Ni–P alloy could be used as a mold material for industrial glass molding. If Ni is electroless plated when mixed with suitable amount of P on a Si wafer, the Ni–P alloy layer becomes amorphous. An appropriate ratio of Ni and P was determined by the results of x-ray-diffraction measurements. The optimized composition ratio of Ni–P was Ni:P=92:8wt%. Moreover, line and space patterns and dot arrays with linewidths of as little as 500nm were etched on the mold using focused-ion beam (FIB) and the processing accuracy for the amorphous Ni–P layer was compared with that for the pure Ni layer. The result was that pat... |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|