23.3:Invited Paper: Upgrading Self-Aligned Imprint Lithography (SAIL) in Preparation for Roll-to-Roll Manufacturing of Large-Sized High-Performance Flexible Electronics

Autor: Han-Jun Kim, Carl Taussig, Alejandro de la Fuente Vornbrock, Albert Jeans, John Maltabes, Hao Luo, Ping Mei, Craig Perlov, Richard E. Elder, Edward Holland, Randy Hoffman, Neil Morrison
Rok vydání: 2013
Předmět:
Zdroj: SID Symposium Digest of Technical Papers. 44:275-278
ISSN: 0097-966X
DOI: 10.1002/j.2168-0159.2013.tb06199.x
Popis: Self-aligned imprint lithography (SAIL) is currently being upgraded to a next stage to better address the needs for roll-to-roll compatible manufacturing of large-sized flexible OLED display backplanes. Cu and oxide semiconductors are preferred choices of materials, and control of process and yield becomes even more important an issue.
Databáze: OpenAIRE