Booster Fillpattern Monitor
| Autor: | Falkenstern, Fjodor, Kuszynski, Jens, Rehm, Guenther |
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| Jazyk: | angličtina |
| Rok vydání: | 2022 |
| Předmět: | |
| DOI: | 10.18429/jacow-ibic2022-wep31 |
| Popis: | The "Booster Fillpattern Monitor" is used to measure currents in each individual electron bunch in the booster of the BESSY II machine. The booster with its circumference of 96 meters has space for max.160 electron bunches. The distance between the electron bunches of 60cm (96m/160) is determined by the RF Master Clock ~ 499, 627MHz. In practice, fill patterns of a one to five equally spaced bunches are in use. The fill pattern monitor digitizes electrical pulses generated from a strip line using a broadband ADC. The sampling frequency is selected as an integer fraction of the bunching frequency, acquiring the full fill pattern over a number of turns. Experiments performed at BESSY II demonstrate the performance of the setup and will be discussed. Proceedings of the 11th International Beam Instrumentation Conference, IBIC2022, Kraków, Poland |
| Databáze: | OpenAIRE |
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