Atmospheric pressure chemical vapour deposition of BPSG films from TEOS, 03, TMB, TMPI: Determination of a chemical mechanism

Autor:	J.-P. Couderc, L. Jeannerot, Brigitte Caussat, J.-P. Nieto, I. Orain
Rok vydání:	2002
Předmět:	chemistry.chemical_compound Reaction mechanism Reaction rate constant Ozone Atmospheric pressure Chemical engineering Chemistry Borosilicate glass Continuous reactor Inorganic chemistry General Physics and Astronomy Deposition (phase transition) Chemical vapor deposition
Zdroj:	Journal de Physique IV (Proceedings). 12:37-44
ISSN:	1155-4339
DOI:	10.1051/jp4:20020075
Popis:	APCVD of boro-phospho silicate glass from mixtures of TEOS, TMB and TMP i has been analysed then modelled in a continuous reactor. A reduced chemical mechanism has been developed and the corresponding rate constants have been identified. The first results obtained are encouraging and suggest that the very simple gas phase chemistry selected could be precise enough to represent the main trends of this very complex deposition procedure.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::25a7f5ab2f422f23ecaff022321cd860 https://doi.org/10.1051/jp4:20020075 Zobrazit plný text záznamu