Unimolecular Decomposition of Methyltrichlorosilane: RRKM Calculations

Autor:	Mark D. Allendorf, Thomas H. Osterheld, Carl F. Melius
Rok vydání:	1994
Předmět:	Chemical kinetics Sticking coefficient chemistry.chemical_compound Silanes Atmospheric pressure Chemistry General Engineering Molecule Physical chemistry Chemical vapor deposition Physical and Theoretical Chemistry Chemical reaction Methyltrichlorosilane
Zdroj:	The Journal of Physical Chemistry. 98:6995-7003
ISSN:	1541-5740 0022-3654
DOI:	10.1021/j100079a018
Popis:	published in Advance ACS Abstracts, January 1, 1994. sure.21-23 One of the most common reactants used in these processes is methyltrichlorosilane (CH3SiC13, MTS), which is favored because it is nonpyrophoric and inexpensive. It has been shown that MTS decomposes under typical Sic CVD conditions (atmospheric pressure, deposition temperatures > 1400 K), producing HCl, SiHCl3, SiCL and CH4 as well as other silanes and hydro~arbons.24,~~ Thesedecomposition products result from both primary and secondary reaction pathways. Models used to optimize and scale-up new Sic CVD processes require detailed knowledge of the gas-phase chemistry for two important reasons. First, the high activation energies of MTS unimolecular reactions may make them the rate-limiting step in the deposition, particularly for low-temperature processes. Second, the surface reactivity of the various gas-phase product species, as character- ized by a reactive sticking coefficient I', varies widely. Saturated molecules such as Sic14 react with26
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::25891b27a73468e39823ee93d039381e https://doi.org/10.1021/j100079a018 Zobrazit plný text záznamu