Electrical and structural characterization of 150 nm CNT contacts with Cu damascene top metallization

Autor:	Daire J. Cott, Marleen H. van der Veen, Bart Vereecke, Xiaoxing Ke, Stefan De Gendt, Yusaku Kashiwagi, Masahito Sugiura, Johannes Vanpaemel, Philippe M. Vereecken, Zsolt Tokei, Cedric Huyghebaert
Rok vydání:	2012
Předmět:	Materials science business.industry Copper interconnect Electrical breakdown chemistry.chemical_element Nanotechnology Carbon nanotube Copper Aspect ratio (image) Electrical contacts law.invention Metal chemistry law visual_art visual_art.visual_art_medium Optoelectronics business Tin
Zdroj:	2012 IEEE International Interconnect Technology Conference.
Popis:	This paper discusses the electrical and structural characterization of 150 nm diameter contacts filled with carbon nanotubes (CNTs) and a Cu damascene top metal. We present the first images of CNTs in direct contact with the top metal. A CNT tip clean before metallization reduced the single CNT contact hole resistance from 4.8 kΩ down to 2.8 kΩ (aspect ratio 2.4). The first basic electrical breakdown experiments with Kelvins resulted in high breakdown currents of 5–13 MA/cm2.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::25804f93313995f684818e122b22459d https://doi.org/10.1109/iitc.2012.6251670 Zobrazit plný text záznamu