Ultrafast-laser-induced parallel phase-change nanolithography

Autor:	LP Shi, GX Chen, Zengbo Wang, Y Lin, Leng Seow Tan, C. S. Lim, Minghui Hong, TC Chong
Rok vydání:	2006
Předmět:	Nanolithography Materials science Physics and Astronomy (miscellaneous) law Etching (microfabrication) Microscopy Femtosecond Near-field scanning optical microscope Nanotechnology Laser Ultrashort pulse Amorphous solid law.invention
Zdroj:	Applied Physics Letters. 89:041108
ISSN:	1077-3118 0003-6951
DOI:	10.1063/1.2235855
Popis:	A phase-change nanolithography technique is developed to fabricate up to millions of two-/three-dimensional nanostructures (∼50nm) over a large area at a high speed by combining femtosecond laser, microlens array, and wet etching process. Near-field scanning optical microscopy, electrical force microscopy, and atomic force microscopy were used to characterize optical and electrical properties of crystalline and amorphous states, respectively. Different reactions of both amorphous and crystalline areas in phase-change film to alkaline solution are demonstrated. Multiphoton absorption and ultrashort pulse contribute to nanostructure generation. This method opens up a route for nanodevice fabrication with phase-change material.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::255db477b44c8b355045dad3ccb137db https://doi.org/10.1063/1.2235855 Zobrazit plný text záznamu