Interaction Analysis of DI-water/Air/ArF Resist System using Atomic Force Microscope

Autor:	Takayoshi Niiyama, Akira Kawai
Rok vydání:	2005
Předmět:	Materials science Polymers and Plastics Resist Atomic force microscopy Organic Chemistry Materials Chemistry Nanotechnology Immersion lithography Electron-beam lithography Surface energy
Zdroj:	Journal of Photopolymer Science and Technology. 18:373-380
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.18.373
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::24f1f115e9564e352bb207737a9296b0 https://doi.org/10.2494/photopolymer.18.373 Zobrazit plný text záznamu