Effect of sputtering power on structure and properties of ZTO films
| Autor: | Ling Bing Kong, Hua Zhu, Shijin Yu, Qiuyun Fu, Wangren Qiu, Wanmei Xu |
|---|---|
| Rok vydání: | 2021 |
| Předmět: |
Materials science
business.industry Mechanical Engineering Metals and Alloys 02 engineering and technology Substrate (electronics) Crystal structure Sputter deposition 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences Grain size 0104 chemical sciences Mechanics of Materials Sputtering Materials Chemistry Optoelectronics Thin film 0210 nano-technology business Electrical conductor Wurtzite crystal structure |
| Zdroj: | Journal of Alloys and Compounds. 883:160622 |
| ISSN: | 0925-8388 |
| DOI: | 10.1016/j.jallcom.2021.160622 |
| Popis: | Transparent conductive tin-doped zinc oxide (ZTO) thin films were deposited on glass substrate by using radio frequency (RF) magnetron sputtering method. The effect of sputtering power on crystalline structure, morphology, optical and electrical properties of the ZTO film was systematically studied. XRD results showed that the as-deposited ZTO thin films had a hexagonal wurtzite structure, with (002) orientation. Combining with SEM images, it was found that the grain size was increased with increasing sputtering power. The AFM images revealed that low sputtering powers of |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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