Slip Free Rapid Thermal Processing

Autor:	Blake Julian G, John F. Moquin, Ron Capodilupo, James Schlueter, Jeffrey C. Gelpey
Rok vydání:	1987
Předmět:	Materials science Differential interference contrast microscopy business.industry Rapid thermal processing Optical surface Optoelectronics Process optimization Wafer Slip (materials science) business Control parameters Oxygen content
Zdroj:	MRS Proceedings. 92
ISSN:	1946-4274 0272-9172
Popis:	Slip is a primary concern in Rapid Thermal Processing (RTP). Diagnostics for slip are compared, including: visual inspection, differential interference contrast microscopy (Nomarski), X-ray topography, decorative etching and optical surface scanning. Data from each technique are presented. RTP control parameters (temperature uniformity, heat up and cool down rates, edge cooling) and substrate parameters (wafer size, oxygen content, edge damage) which may have an effect on slip are discussed. Typical results for implant annealing sequences on a water-wall DC arc lamp RTP system are presented and used to suggest techniques for process optimization.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::24924b7929961dba0f6b9f7034964e26 https://doi.org/10.1557/proc-92-265 Zobrazit plný text záznamu Full text from SpringerLink