Influence of oxygen pressure on the ferroelectric properties of epitaxialBiFeO3thin films by pulsed laser deposition

Autor:	Kui Yao, Ngeah Theng Chua, Lu You, Lang Chen, Junling Wang
Rok vydání:	2009
Předmět:	Materials science Carbon film Condensed matter physics Phase (matter) Physical vapor deposition Multiferroics Thin film Combustion chemical vapor deposition Condensed Matter Physics Ferroelectricity Electronic Optical and Magnetic Materials Pulsed laser deposition
Zdroj:	Physical Review B. 80
ISSN:	1550-235X 1098-0121
DOI:	10.1103/physrevb.80.024105
Popis:	The growth window of multiferroic ${\text{BiFeO}}_{3}$ thin films is very small. Both temperature and oxygen pressure will affect the film quality and phase purity significantly. We demonstrate here that even within the window where phase pure ${\text{BiFeO}}_{3}$ thin films can be obtained, different oxygen partial pressures still lead to substantial variation in Bi/Fe ratio in the film, which closely link with the corresponding ferroelectric properties. Piezoelectric force microscopy also reveals significant difference in the domain structures of these films. A defect-dipole complex model is proposed to explain the difference in the electrical properties and domain structures for films grown under different oxygen pressures.
Databáze:	OpenAIRE
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