Graphite formation on Ni film by chemical vapor deposition
| Autor: | Yoshimasa Ohki, T. Matsui, Mark Baxendale, Rie Kikuchi, Etsuro Ota, Susumu Yoshimura, Masako Yudasaka |
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| Rok vydání: | 1996 |
| Předmět: |
Materials science
Metals and Alloys Mineralogy chemistry.chemical_element Surfaces and Interfaces Chemical vapor deposition Surfaces Coatings and Films Electronic Optical and Magnetic Materials Nickel Carbon film chemistry Amorphous carbon Chemical engineering Materials Chemistry Graphite Thin film Layer (electronics) Quartz |
| Zdroj: | Thin Solid Films. 280:117-123 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/0040-6090(95)08224-7 |
| Popis: | Thin film formation of graphite by chemical vapor deposition using 2-methyl-1,2′-naphthyl ketone as a starting material was carried out on Ni film substrates. On Ni films directly deposited on quartz glass, the graphite films were obtained when the Ni film thickness was above 1 000 A and above 5 000 A at 700 °C and 1 000 °C, respectively. Depositions on thinner Ni film substrates comprise amorphous carbon (a-C) or graphite tubes which was owing to the thermal coagulation of the Ni film into droplets. On the other hand, graphite film was obtained on the Ni film with thickness 10 A when a-C was inserted between the Ni film and the quartz glass. The coagulation of the Ni film is considered to be avoided by inserting a-C layer. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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