The effect of defects on the optical nonlinearity of thermally poled SiOx thin films
| Autor: | Roderick Boswell, Marek Samoc, Rongping Wang, Anna Samoc, Wei Li |
|---|---|
| Rok vydání: | 2008 |
| Předmět: |
Materials science
genetic structures Silicon business.industry Poling Metals and Alloys chemistry.chemical_element Nonlinear optics Second-harmonic generation Surfaces and Interfaces Chemical vapor deposition Evaporation (deposition) eye diseases Surfaces Coatings and Films Electronic Optical and Magnetic Materials Optics Optical coating chemistry Materials Chemistry Optoelectronics sense organs Thin film business |
| Zdroj: | Thin Solid Films. 516:5474-5477 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2007.07.027 |
| Popis: | Defects were deliberately induced in SiOx thin films during their deposition using a helicon plasma activated reactive evaporation technique. The films were thermally poled and the poling induced second-order optical nonlinearity was investigated by measuring the second harmonic generation of the samples. It was found that oxygen-rich SiOx thin films containing mainly peroxy radicals enabled a much larger optical nonlinearity than stoichiometric SiO2 films after poling, and their optical nonlinearity was long-time stable; while silicon-rich SiOx thin films containing mainly oxygen vacancy defects presented a smaller and unstable optical nonlinearity after poling. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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