Lithography system holistic optimization with low stage vibration sensitivity

Autor:	李艳秋 Li Yanqiu, 韦鹏志 Wei Pengzhi, 刘丽辉 Liu Lihui, 盛乃援 Sheng Naiyuan
Rok vydání:	2019
Předmět:	Vibration Materials science Space and Planetary Science business.industry Aerospace Engineering Optoelectronics Sensitivity (control systems) Stage (hydrology) Electrical and Electronic Engineering business Lithography Atomic and Molecular Physics and Optics
Zdroj:	Infrared and Laser Engineering. 48:1215001
ISSN:	1007-2276
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::233d320b3f6eda7ae4ce0e260e8b5400 https://doi.org/10.3788/irla201948.1215001 Zobrazit plný text záznamu