Characteristics of titanium arc evaporation processes
| Autor: | B. W. James, David R. McKenzie, Karl-Heinz Müller, P.D. Swift, Roger P. Netterfield, C. G. Pacey, Phil J. Martin, S.W. Filipczuk |
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| Rok vydání: | 1987 |
| Předmět: |
Chemistry
Metals and Alloys Evaporation Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Plasma Microstructure Cathode Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Ion Condensed Matter::Materials Science law Ionization Materials Chemistry Tin Titanium |
| Zdroj: | Thin Solid Films. 153:91-102 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/0040-6090(87)90173-8 |
| Popis: | The characteristic photon and ion emissions from a titanium cathodic arc evaporator have been studied. The composition of the background gas in the vacuum vessel was found to influence the emissions strongly. High resolution optical spectroscopy revealed that the neutral titanium atoms had a lower velocity distribution than had the ionized particles. Ion energy analysis indicated that charge exchange processes dominate at high background pressures. External magnetic fields applied to the plasma stream were found to excite the vapour and to accelerate the ions. Internal fields applied to the cathode surface were found to increase the cathode spot velocity to a maximum of around 25 m s-1. Application of an external field resulted in deposited titanium films with a reduced microdroplet component whereas an internal field had no effect. The film quality further improved with the introduction of reactive gases such as oxygen and nitrogen. The properties of the deposited titanium, TiO2 and TiN films were examined as a function of the external field strength. |
| Databáze: | OpenAIRE |
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