Using Raman Microscopy to Detect Leaks in Micromechanical Silicon Structures
| Autor: | M. J. Pelletier, M. Zanini-Fisher, W. H. Weber |
|---|---|
| Rok vydání: | 1997 |
| Předmět: |
Materials science
Silicon business.industry Confocal 010401 analytical chemistry chemistry.chemical_element 01 natural sciences Noise (electronics) Spectral line 0104 chemical sciences law.invention 010309 optics symbols.namesake Optics chemistry Confocal microscopy law 0103 physical sciences Microscopy symbols Raman microscope Raman spectroscopy business Instrumentation Spectroscopy |
| Zdroj: | Applied Spectroscopy. 51:123-129 |
| ISSN: | 1943-3530 0003-7028 |
| DOI: | 10.1366/0003702971938876 |
| Popis: | We demonstrate the use of Raman microscopy for leak detection in hermetically sealed micromachined accelerometers. Leaks were indicated by the presence of a foreign gas, in this case oxygen, in the 70-μm-deep cavity enclosing the accelerometer between a silicon cap and a Pyrex® window. Confocal, nondiffraction-limited operation of the Raman microscope utilized the available pathlength in the sample while still rejecting most of the fluorescence from the Pyrex®. Raman peak intensities were accurately determined in the presence of noise by fitting the spectra to a function that modeled the unresolved Q-branch line shapes of oxygen and nitrogen. |
| Databáze: | OpenAIRE |
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