Modification Of Properties Of Ion-Beam-Sputtered Yttrium-Oxide Thin Films By Low-Energy Ion Bombardment

Autor:	L. F. Johnson, M. B. Moran, Karl A. Klemm
Rok vydání:	1991
Předmět:	Materials science Argon Ion beam chemistry Analytical chemistry chemistry.chemical_element Yttrium Substrate (electronics) Thin film Yttria-stabilized zirconia Amorphous solid Ion
Zdroj:	MRS Proceedings. 223
ISSN:	1946-4274 0272-9172
DOI:	10.1557/proc-223-295
Popis:	The effect of low-energy ion bombardment on ion-beam-sputtered yttrium-oxide films was studied. Yttria films were subjected to argon ions accelerated by a potential of up to 500 V with current densities of up to 8 μA/cm2 and were deposited at differing substrate temperatures. Yttria films bombarded during deposition were found to be amorphous, and trends observed with increased ion energy include reduced amount of residual compressive stress, increased argon content, and decreased refractive index, depending on deposited energy and substrate temperature.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::230fe4d4bea3699a2b61721d78fed3fb https://doi.org/10.1557/proc-223-295 Zobrazit plný text záznamu Full text from SpringerLink