Large area, cost effective X-ray masks for high energy photons
| Autor: | E. Stiers, B. Chaudhuri, K. Fischer, Henry Guckel |
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| Rok vydání: | 2000 |
| Předmět: |
Materials science
Cost effectiveness business.industry Photoresist Condensed Matter Physics Electronic Optical and Magnetic Materials Optics Hardware and Architecture Electroforming Miniaturization X-ray lithography Electrical and Electronic Engineering LIGA business Lithography Throughput (business) |
| Zdroj: | Microsystem Technologies. 6:117-120 |
| ISSN: | 1432-1858 0946-7076 |
| Popis: | The cost effectiveness of the deep X-ray lithography and electrodeposition process, LIGA, depends directly on the throughput of the process. The use of high energy photons allows the exposure of stacked photoresist and results in high throughput. High energy X-ray exposures require a different mask than low energy X-ray exposures. The high energy mask allows a large area exposure but requires a thicker X-ray absorber. The cost of generating high energy X-ray masks can be drastically reduced by using a thick optical photoresist process rather than an X-ray exposure process. The cost can be further reduced by using alternatives to the typical X-ray absorber, gold. High atomic weight (high Z) materials are ideal absorbers. Lead has been demonstrated as being a useable alternative as an X-ray absorber. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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