Evaluation of Curing Characteristics in UV-NIL Resist

Autor:	Nobuji Sakai, Atsushi Sekiguchi, Ryosuke Suzuki, Risa Tanaka, Yoshihiko Hirai, Yoko Matsumoto
Rok vydání:	2010
Předmět:	Materials science Polymers and Plastics Resist business.industry law Organic Chemistry Materials Chemistry Optoelectronics Composite material business Curing (chemistry) Nanoimprint lithography law.invention
Zdroj:	Journal of Photopolymer Science and Technology. 23:51-54
ISSN:	1349-6336 0914-9244
DOI:	10.2494/photopolymer.23.51
Popis:	Mechanical characteristics of UV curable resist for UV nanoimprint lithography are investigated using UV rheology meter. Modulations of visco-elatic properties and thickness shrinkages in typical resists are evaluated in variation of exposure UV intensity. The mechanical modulation speed of the resist depends on the UV intensity, which affects to throughput of UV nanoimprint lithography process. To handle the characteristics universally, effective conversion time is newly introduced, which fairly expresses the resist modifications.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::22f957e9975264ee57dcd7bfbcfee6ee https://doi.org/10.2494/photopolymer.23.51 Zobrazit plný text záznamu