Autor: |
Hisashi Kaneko, Takashi Kawanoue, Masami Miyauchi, Hiroshi Toyoda, Masahiko Hasunuma |
Rok vydání: |
1994 |
Předmět: |
|
Zdroj: |
Proceedings of 1994 IEEE International Reliability Physics Symposium RELPHY-94. |
DOI: |
10.1109/relphy.1994.307839 |
Popis: |
A new fabrication technique for hyper-textured aluminum (Al) films has been developed by using an amorphous tantalum-aluminum (Ta-Al) underlayer. The full width at half maximum (FWHM) value of the (111) rocking curve for Al film has been attained to be less than 1 degree. It has been clarified that the empirical relation between the electromigration (EM) lifetime of an Al interconnection /spl tau/ and the FWHM value /spl omega/ is described as /spl tausup /spl prop/spl omegasup -2/. This result has confirmed that a hyper-texture is a promising approach to withstand higher current densities required in future ULSIs. > |
Databáze: |
OpenAIRE |
Externí odkaz: |
|