Improvement in the electromigration lifetime using hyper-textured aluminum formed on amorphous tantalum-aluminum underlayer

Autor: Hisashi Kaneko, Takashi Kawanoue, Masami Miyauchi, Hiroshi Toyoda, Masahiko Hasunuma
Rok vydání: 1994
Předmět:
Zdroj: Proceedings of 1994 IEEE International Reliability Physics Symposium RELPHY-94.
DOI: 10.1109/relphy.1994.307839
Popis: A new fabrication technique for hyper-textured aluminum (Al) films has been developed by using an amorphous tantalum-aluminum (Ta-Al) underlayer. The full width at half maximum (FWHM) value of the (111) rocking curve for Al film has been attained to be less than 1 degree. It has been clarified that the empirical relation between the electromigration (EM) lifetime of an Al interconnection /spl tau/ and the FWHM value /spl omega/ is described as /spl tausup /spl prop/spl omegasup -2/. This result has confirmed that a hyper-texture is a promising approach to withstand higher current densities required in future ULSIs. >
Databáze: OpenAIRE