Principles of optical design of the SM beamline at the CLS

Autor:	Adam P. Hitchcock, Stephen G. Urquhart, I. Blomqvist, K. Kaznacheyev, D. Loken, T. Tyliszczak, Tony Warwick, E. Hallin
Rok vydání:	2004
Předmět:	Physics business.industry Resolution (electron density) Synchrotron radiation X-ray optics Undulator law.invention Photoemission electron microscopy Optics Beamline law Microscopy business Monochromator
Zdroj:	AIP Conference Proceedings.
ISSN:	0094-243X
DOI:	10.1063/1.1758040
Popis:	The spectromicroscopy beamline (SM) at the Canadian Light Source (CLS) will provide 100 – 2000 eV photons in a high brightness, high flux, medium resolution and small spot size beam. The beamline consists of an advanced elliptically polarized undulator (EPU) source and a novel entrance slit‐less plane grating monochromator which feeds two branch lines, one optimized for scanning transmission X‐ray microscopy (STXM), the other for X‐ray photoemission electron microscopy (X‐PEEM). This article outlines the beamline design strategy, and discusses the design optimization relative to the requirements for state‐of‐the‐art STXM and X‐PEEM.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::22bae440e2bf9f19455bf6e12586c5d3 https://doi.org/10.1063/1.1758040 Zobrazit plný text záznamu