Etching of Zn x Cd1 − x Te by solutions of the HNO3-HBr-citric acid system
| Autor: | V. N. Tomashik, Z. F. Tomashik, G. M. Okrepka |
|---|---|
| Rok vydání: | 2009 |
| Předmět: |
Materials science
General Chemical Engineering Kinetics Inorganic chemistry Metals and Alloys Polishing Isotropic etching Cadmium telluride photovoltaics Inorganic Chemistry Crystallography chemistry.chemical_compound chemistry Etching (microfabrication) Materials Chemistry Citric acid Dissolution Solid solution |
| Zdroj: | Inorganic Materials. 45:731-736 |
| ISSN: | 1608-3172 0020-1685 |
| DOI: | 10.1134/s002016850907005x |
| Popis: | Chemical etching of CdTe single crystals and Zn xCd1−xTe solid solutions by bromine-evolving etchants of the HNO3-HBr-citric acid system is studied. Projections of the surfaces of equal dissolution rates are plotted; the kinetics of etching processes and the influence exerted on it by the composition of solid solutions and initial concentrations of citric acid are found. The concentration limits of solutions for chemicody-namical polishing of surfaces of the mentioned semiconductors are determined. |
| Databáze: | OpenAIRE |
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