Effects of electron irradiation on the properties of GZO films deposited with RF magnetron sputtering
Autor: | H.M. Lee, Y.J. Lee, Dong-Hyuk Choi, S.B. Heo, Myoung-Soo Kang, Ik-Jei Kim, Yong Soo Kim, Daeil Kim, Man-Chul Kim, Byung-Hoon Lee |
---|---|
Rok vydání: | 2012 |
Předmět: |
Materials science
business.industry General Physics and Astronomy Surfaces and Interfaces General Chemistry Sputter deposition Condensed Matter Physics Electron spectroscopy Surfaces Coatings and Films X-ray photoelectron spectroscopy Sputtering Electron beam processing Optoelectronics Work function Irradiation business Sheet resistance |
Zdroj: | Applied Surface Science. 258:3903-3906 |
ISSN: | 0169-4332 |
DOI: | 10.1016/j.apsusc.2011.12.057 |
Popis: | Transparent conductive GZO films were deposited on polycarbonate substrates by electron beam assisted radio frequency (RF) magnetron sputtering and then the influence of electron irradiation on the structural, optical and electrical properties of GZO films was investigated by using X-ray diffractometry, UV–vis spectrophotometry, four point probes, atomic force microscopy and UV photoelectron spectroscopy. Sputtering power was kept constant at 3 W/cm2 during deposition, while electron irradiation energy varied from 450 to 900 eV. Electron irradiated GZO films show larger grain sizes than those of films prepared without electron irradiation, and films irradiated at 900 eV show higher optical transmittance in the visible wavelength region and lower sheet resistance (120 Ω/□) than other films. The work-function is also increased with electron irradiation energy. The highest work-function of 4.4 eV was observed in films that were electron irradiated at 900 eV. |
Databáze: | OpenAIRE |
Externí odkaz: |