Laser-induced liquid-phase jet-chemical etching of metals
| Autor: | Frank Vollertsen, Andreas Stephen, Gerd Sepold, S. Metev |
|---|---|
| Rok vydání: | 2004 |
| Předmět: |
Jet (fluid)
Fabrication Materials science technology industry and agriculture Metals and Alloys Nanotechnology Shape-memory alloy Laser Isotropic etching Industrial and Manufacturing Engineering Computer Science Applications law.invention Chemical engineering Etching (microfabrication) law Modeling and Simulation Ceramics and Composites Dry etching Reactive-ion etching |
| Zdroj: | Journal of Materials Processing Technology. 149:536-540 |
| ISSN: | 0924-0136 |
| Popis: | In this treatment method laser radiation, which is guided from a co-axially expanding liquid jet-stream, locally initiates on a metal surface a thermochemical etching reaction, which leads to selective material removal. Time-resolved measurements of the electrical potential were correlated with the specific processing parameters to identify conditions for stable and enhanced chemical etching reactions. The chemical etching reaction was additionally influenced by an electrical field. Depending on its polarity a significant increase in the etch rate or improvement of the treatment quality was observed. Exemplary, the fabrication of superelastic micro-grippers prepared by cutting of temperature-sensitive shape memory alloys is shown. |
| Databáze: | OpenAIRE |
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