| Autor: |
Joshua Lessing, Christopher J. Marotta, Marcus Ramstein, Jeff Marshman |
| Rok vydání: |
2002 |
| Předmět: |
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| Zdroj: |
21st Annual BACUS Symposium on Photomask Technology. |
| ISSN: |
0277-786X |
| Popis: |
In this paper, we will be discussing the repair of 193 nm Molybdenum Silicide (MoSiON) phase-shift masks by Focused Ion Beam (FIB) technology. Development of a next generation FIB column has allowed greater resolution of photomask patterns enabling efficient repair of 193 nm MoSiON phase-shift mask defects in patterns as small as 480 nm on the mask. The capabilities of this next generation VisIONT ion beam column achieve enhanced imaging at lower ion beam currents, minimizing damage to the substrate material while improving repair profiles. Both clear defects and opaque defects were investigated. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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