PECVD of SiO₂-like thin films under continuous wave and pulsed modes
| Autor: | Harf-Bapin, Elisabeth I. |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2001 |
| Předmět: |
Chemical engineering
ANGEWANDTE PLASMAPHYSIK PROPERTIES OF THIN LAYERS (PHYSICS OF MOLECULAR SYSTEMS) EIGENSCHAFTEN DÜNNER SCHICHTEN (PHYSIK VON MOLEKULARSYSTEMEN) EPITAXIALSCHICHTEN (PHYSIK VON MOLEKULARSYSTEMEN) APPLIED PLASMA PHYSICS THIN LAYER FORMATION BY VAPORIZATION AND CONDENSATION (PHYSICS OF MOLECULAR SYSTEMS) FOS: Chemical engineering |
| DOI: | 10.3929/ethz-a-004319846 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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