Thermally Induced Intramolecular Surface Reactions on a Photoimageable Dielectric
| Autor: | Luis J. Matienzo and, Anastasios P. Angelopoulos, Gerald Walter Jones |
|---|---|
| Rok vydání: | 1999 |
| Předmět: |
Sulfonium
Aryl Inorganic chemistry technology industry and agriculture Cationic polymerization Surfaces and Interfaces Dielectric Condensed Matter Physics Photochemistry chemistry.chemical_compound Adsorption X-ray photoelectron spectroscopy chemistry Polymerization Electrochemistry General Materials Science Reactivity (chemistry) Spectroscopy |
| Zdroj: | Langmuir. 16:1078-1082 |
| ISSN: | 1520-5827 0743-7463 |
| DOI: | 10.1021/la981692w |
| Popis: | The effect of bake temperature on the surface chemistry of a photoimageable dielectric is investigated. The dielectric contains mixtures of multifunctional bisphenol A based epoxies which are polymerized using cationic aryl sulfonium hexafluoroantimonate. Surface characterization via X-ray photoelectron spectroscopy and contact-angle titration reveals that baking the dielectric yields nucleophilic sulfur substitution of hydroxylated surface species to produce a diphenyl sulfoxide reaction product. Such reactivity provides a convenient means of altering the dielectric surface acidity. Surface acidity is shown to be well correlated to the adsorption of a high molecular weight cationic polyacrylamide deposited from solution during microelectronics fabrication. |
| Databáze: | OpenAIRE |
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