The preparation of polysiloxane xerogels containing amide derivatives of phosphonic and thiophosphonic acids in the surface layer

Autor:	O. A. Dudarko, Yu. L. Zub, V. Ya. Semenii, A. Dabrowski
Rok vydání:	2007
Předmět:	Chemistry Hydrogen bond Thio Surfaces and Interfaces Silane chemistry.chemical_compound Silanol Residue (chemistry) Colloid and Surface Chemistry Amide Polymer chemistry Organic chemistry Molecule Physical and Theoretical Chemistry Sol-gel
Zdroj:	Colloid Journal. 69:66-74
ISSN:	1608-3067 1061-933X
DOI:	10.1134/s1061933x07010097
Popis:	Xerogels containing residues of amide derivatives of phosphonic and thiophosphonic acids, ≡Si(CH2)3NHP(S, O)(OC2H5)2 (functional group concentration of 1.3–2.2 mmol/g) have been prepared by a sol-gel method. It has been shown that xerogels having a developed porous structure (with specific surface areas of 240–485 m2/g, pore volumes of 0.20–0.50 cm3/g, and pore diameters of 3.6–6.5 nm) are formed at tetraethoxysilane-to-trifunctional silane ratios of 4: 1 (and above) and 6: 1 (and above) for the derivatives of phosphonic and thiophosphonic acids, respectively. The IR and 13C CP/MAS NMR spectroscopy data have demonstrated that the surface layer of the xerogels contains not only (thio)phosphonic acid residues, but also silanol groups and water molecules participating in hydrogen bonding. The 29Si CP/MAS NMR spectroscopy data have indicated that structural groups are, for the most part, contained in structural units T3 [(≡SiO)3Si(CH2)3NHP(O, S)(OC2H5)2] and T2 [(≡SiO)2Si(OR)[(CH2)3NHP(O, S)(OC2H5)2] (R = H or C2H5).
Databáze:	OpenAIRE
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