A Study of Temperature Effect on Ta+N Ion-Implanted Hardalloy

Autor:	Zheng Yong-zhen, Geng Man, Tong Honghui, Zhao Feng, Zhao Qing
Rok vydání:	2001
Předmět:	Auger electron spectroscopy Materials science Scanning electron microscope Alloy Analytical chemistry Tantalum chemistry.chemical_element engineering.material Nitride Tungsten Condensed Matter Physics Hardness Indentation hardness Crystallography chemistry engineering
Zdroj:	Plasma Science and Technology. 3:897-902
ISSN:	1009-0630
DOI:	10.1088/1009-0630/3/4/010
Popis:	Hard alloy were implanted with a dual-ion of nitrogen and tantalum at temperature of 100 ?C and 400 ?C at a dose of 8?1017 ions cm-2. Auger electron spectroscopy (AES) was used to determine the nitrogen and tantalum concentration profiles. Microhardness measurements were performed to evaluate the improvements in surface property. The thickness of implanted layers increased by about an order of magnitude when the temperature was elevated from 100 ?C to 400 ?C. A higher surface hardness was also obtained in the higher temperature implantation. Scanning electron microscopy (SEM) image showed distinct microstructural changes, and x-ray diffraction (XRD) analysis showed the presence of nitrides of tantalum and tungsten on the surface implanted.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::207f4cfb48c4282a806e9c74318bc357 https://doi.org/10.1088/1009-0630/3/4/010 Zobrazit plný text záznamu