Beam profile reflectometry: A new technique for dielectric film measurements

Autor:	Jon Opsal, David L. Willenborg, S. M. Kelso, Allan Rosencwaig, Jeffrey T. Fanton
Rok vydání:	1992
Předmět:	Materials science Optics Physics and Astronomy (miscellaneous) business.industry Linear polarization Thin metal Dielectric Thin film Reflectometry business Laser beams Beam (structure) Semiconductor laser theory
Zdroj:	Applied Physics Letters. 60:1301-1303
ISSN:	1077-3118 0003-6951
DOI:	10.1063/1.107323
Popis:	We describe a new technique for measuring the thickness and optical constants of dielectric, semiconducting, and thin metal films. Beam profile reflectometry provides excellent precision for films as thin as 30 A and as thick as 20 000 A. The technique is also capable of simultaneous 2 and 3 parameter measurements and it performs all measurements with a submicron spot size.
Databáze:	OpenAIRE
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