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A series of AlCuFe films were deposited by magnetron sputtering and subjected to X-ray diffraction and tribological testing to elucidate the correlation between quasicrystalline phase content and coefficient of friction. The sputter target was a pressed powder target comprised of a mixture of elemental powders combined in the ratio Al65Cu23Fe12 and pressed at 400°C. This target was designed to produce film compositions within the single-phase icosohedral quasicrystalline regime. X-ray diffraction performed on the as-deposited coatings showed that they were comprised of a nanoscale/amorphous precursor phase with broad X-ray diffraction maxima. Anneals of the as-deposited films were performed at 450 or 500°C in argon for various times to cause partial or full development of the quasicrystalline microstructure, and films were tribo-tested in two separate systems. The first of these was an oscillating pin-on-flat system, in which a coated 2 mm diameter pin was used to test as-deposited films at temperatures of up to 220°C under vacuum and a 15 g load. The second system used a 0.25″ diameter alumina ball and a load of 100 g to test films in air at temperatures of 25, 150, and 300°C. Various anneal conditions were also tested. For an as-deposited coating, a coating annealed for 2 h at 450°C, and a coating annealed for 1h at 500°C, the observed coefficients of friction were 0.45, 0.23, and 0.17, respectively. Correlation between quasicrystalline phase content, room temperature friction coefficient, and appearance of the wear track clearly showed that annealing to the fully developed quasicrystalline structure resulted in a harder film with a lower coefficient of friction. |
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