Characterization of antireflective coatings on poly(methyl methacrylate) substrate by different process parameters
| Autor: | Yuan-Shun Zhang, Wei-Ming Chiu, Peir-An Tsai, Jyh-Horng Wu |
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| Rok vydání: | 2013 |
| Předmět: |
Spin coating
Materials science Polymers and Plastics High-refractive-index polymer General Chemistry engineering.material Methacrylate Poly(methyl methacrylate) Dip-coating Surfaces Coatings and Films law.invention Anti-reflective coating Coating law visual_art Polymer chemistry Materials Chemistry visual_art.visual_art_medium engineering Composite material Thin film |
| Zdroj: | Journal of Applied Polymer Science. 129:2411-2417 |
| ISSN: | 0021-8995 |
| DOI: | 10.1002/app.38975 |
| Popis: | The high/low refractive index organic/inorganic antireflective (AR) hybrid polymers were formed using the sol–gel process, in which TiO2/2-hydroxyethyl methacrylate (2-HEMA) (high refractive index hybrid polymer) and SiO2/2-HEMA (low refractive index hybrid polymer) two-layer thin films were formed on a hard coating deposited poly(methyl methacrylate) (HC-PMMA) substrate by both spin coating and dip coating. The relationship between the process parameters and the optical properties, thickness, porosity, surface morphology, and adhesion was determined. The results show that the reflectance of the two-layer thin films on HC-PMMA substrate is less than 0.21% (λ = 550 nm), with good adhesion (5B) and a hardness of up to 4H. In addition, the thickness, porosity, and roughness of the films affect refractive index and the antireflection properties of the AR two-layered thin film. © 2013 Wiley Periodicals, Inc. J. Appl. Polym. Sci., 2013 |
| Databáze: | OpenAIRE |
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