Growth and optical characterization of ZnO thin films deposited on sapphire substrate by MOCVD technique
| Autor: | A. El-Yadouni, Vincent Sallet, Robert Triboulet, A. Boudrioua, J.C. Loulergue |
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| Rok vydání: | 2005 |
| Předmět: |
Materials science
business.industry Organic Chemistry Chemical vapor deposition Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Inorganic Chemistry Optical axis symbols.namesake Optics symbols Sapphire Optoelectronics Metalorganic vapour phase epitaxy Electrical and Electronic Engineering Physical and Theoretical Chemistry Thin film business Raman spectroscopy Layer (electronics) Refractive index Spectroscopy |
| Zdroj: | Optical Materials. 27:1391-1395 |
| ISSN: | 0925-3467 |
| Popis: | Thin films of Zinc oxide (ZnO) are deposited on sapphire substrates by a metalorganic chemical vapour deposition (MOCVD) process. ZnO thin films were characterized by X-ray diffraction, Raman spectroscopy. Investigation of film’s guiding and optical properties is performed using m-lines spectroscopy. Ordinary and extraordinary refractive indices and the optical anisotropy are determined from TE and TM mode excitations. An analysis of optical anisotropy using guided modes with the optical axis oriented normal to the film’s surface confirm the layer’s uniaxial nature. Finally, the optical propagation loss was determined around 4.17 dB/cm at 632.8 nm. |
| Databáze: | OpenAIRE |
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