Plasma induced long-term growth enhancement of Raphanus sativus L. using combinatorial atmospheric air dielectric barrier discharge plasmas

Autor:	Thapanut Sarinont, Nobuya Hayashi, Satoshi Kitazaki, Kazunori Koga, Masaharu Shiratani
Rok vydání:	2014
Předmět:	biology Scanning electron microscope Chemistry Analytical chemistry food and beverages General Physics and Astronomy Raphanus Dielectric barrier discharge Plasma biology.organism_classification Etching (microfabrication) Seedling Electrode General Materials Science Irradiation
Zdroj:	Current Applied Physics. 14:S149-S153
ISSN:	1567-1739
Popis:	Combinatorial analysis has been carried out to investigate the long-term effects of plasma irradiation of radish seeds on the subsequent sprout growth (Raphanus sativus L.) using atmospheric dielectric barrier discharge plasmas in air. The average seedling length was maximized with 180 s of plasma irradiation when the seed was 5 mm from the electrode edge and 3 mm below the electrode. With these parameters the average seedling length was 250% longer than that not irradiated after three days of cultivation. Observation of the seeds using an infrared (IR) camera and scanning electron microscopy revealed that the temperature rise and etching of the seeds during the plasma irradiation have little effect on growth enhancement. The interaction between radicals and seeds for a duration of 180 s leads to the growth enhancement of radish sprouts for 7 days.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::1fe390532a7c3806ab1e5328cbd29011 https://doi.org/10.1016/j.cap.2013.11.056 Zobrazit plný text záznamu Full Text from ScienceDirect