A Novel Organic Low-k Film Deposited by Plasma-Enhanced Co-Polymerization

Autor:	Akinori Nakano, Keizo Kinoshita, Jun Kawahara, Takamaro Kikkawa, Nobutaka Kunimi, Masashi Komatsu
Rok vydání:	2005
Předmět:	chemistry.chemical_classification Materials science chemistry.chemical_element Polymer Plasma Dielectric chemistry.chemical_compound symbols.namesake Monomer chemistry Polymerization Chemical engineering symbols Moiety Raman spectroscopy Carbon
Zdroj:	MRS Proceedings. 863
ISSN:	1946-4274 0272-9172
DOI:	10.1557/proc-863-b8.1
Popis:	A new organic precursor was designed and synthesized in order to form polymer films having low dielectric constants by a plasma-enhanced co-polymerization (PCP) technology. The organic monomer features a large aliphatic hydrocarbon structure, tricyclodecane (TCD) group. Optimized polymer films deposited from the monomer had dielectric constants less than 2.5. A solid 13C-NMR spectrum showed that the TCD moiety in the precursor was included in the polymer without changing the structure. The effect of the deposition temperature on the film structure was studied by analyzing Raman spectra. It was revealed that the dielectric constant is strongly associated with sp2 carbon content in the TCD-based polymer films.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::1fa8debbc350e04067372b4456bd34b5 https://doi.org/10.1557/proc-863-b8.1 Zobrazit plný text záznamu Full text from SpringerLink