Logic via printability enhancement using restricted via placement and exhaustive SRAF placement on a staggered grid

Autor:	Pieter Wöltgens, Alberto Colina, David Rio, Maxence Delorme, Tatiana Kovalevich, Arame Thiam, Frieda van Roey, Odysseas Zografos
Rok vydání:	2022
Zdroj:	Optical and EUV Nanolithography XXXV.
DOI:	10.1117/12.2614260
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::1f506f2068b12c68f8ebbd35d7a79e3b https://doi.org/10.1117/12.2614260 Zobrazit plný text záznamu