Ultralow Water Permeation Barrier Films of Triad a-SiNx:H/n-SiOxNy/h-SiOx Structure for Organic Light-Emitting Diodes
Autor: | Byung Il Choi, Jae Woong Yu, Jun Ho Kong, Keun Yong Lim, Won-Seon Seo, Dong Uk Kim, Won Kook Choi |
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Rok vydání: | 2020 |
Předmět: |
Materials science
Organic solar cell business.industry 02 engineering and technology Substrate (electronics) Chemical vapor deposition Electroluminescence 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences Dip-coating 0104 chemical sciences law.invention chemistry.chemical_compound Silicon nitride chemistry law OLED Optoelectronics General Materials Science 0210 nano-technology business Light-emitting diode |
Zdroj: | ACS Applied Materials & Interfaces. 12:32106-32118 |
ISSN: | 1944-8252 1944-8244 |
DOI: | 10.1021/acsami.0c05858 |
Popis: | Organic electronic devices such as organic light-emitting diodes (OLEDs), quantum dot LEDs, and organic photovoltaics are promising technologies for future electronics. However, achieving long-term stability of organic-based optoelectronic devices has been regarded as a crucial problem to be solved. In this work, a simple and reproducible fabrication method for ultralow water permeation barrier films having a triple-layered (triad) hydrogenated silicon nitride (a-SiNx:H)/nanosilicon oxynitride (n-SiOxNy)/hybrid silicon oxide (h-SiOx) multistructure is presented. Two triad (a-SiNx:H/n-SiOxNy/h-SiOx)n=2 multistructure barrier films are deposited on both sides of a poly(ethylene terephthalate) substrate using a combination of low-pressure plasma-enhanced chemical vapor deposition and dip coating. The deposited films show a high average transmittance (400-700 nm) of 84% and an ultralow water vapor transmission rate of 2 × 10-6 g/m2/day. In the electroluminescence characteristics of OLEDs encapsulated with two triad barrier films, the operational lifetime (T50) of OLEDs is 1584 h, which is almost similar to that (1416 h) of OLEDs encapsulated with a glass lid. |
Databáze: | OpenAIRE |
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