Determination of the composition and thickness of borophosphosilicate glass films by infrared ellipsometry

Autor:	A. Mayeux, Bernard Drevillon, B. Delahaye, Razvigor Ossikovski, M. Firon, N. Blayo
Rok vydání:	1994
Předmět:	Materials science Physics and Astronomy (miscellaneous) chemistry Infrared Ellipsometry Analytical chemistry chemistry.chemical_element Infrared spectroscopy Wafer Chemical vapor deposition Thin film Boron Borophosphosilicate glass
Zdroj:	Applied Physics Letters. 65:1236-1238
ISSN:	1077-3118 0003-6951
DOI:	10.1063/1.112081
Popis:	A quantitative analysis of IR ellipsometry spectra of borophosphosilicate glass (BPSG) thin films deposited on silicon wafers is presented. The film thickness is determined with a standard deviation of 5.8 nm using a fitting procedure based on only two free parameters. A simple linear analysis of the dependence of the ellipsometric measurements upon film composition provides standard deviations of 0.04 and 0.12 wt % on boron and phosphorus content, respectively.
Databáze:	OpenAIRE
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