The interaction of ion implantation with photoresist ashing: A statistical experimental design study

Autor:	Christopher Michael, Lee M. Loewenstein, Jerry A. Stefani
Rok vydání:	1991
Předmět:	Materials science Hydrogen Mass flow Analytical chemistry chemistry.chemical_element Surfaces and Interfaces respiratory system Photoresist Condensed Matter Physics complex mixtures Surfaces Coatings and Films Ion Ion implantation Ashing chemistry Resist Implant Composite material
Zdroj:	Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 9:957-965
ISSN:	1520-8559 0734-2101
Popis:	We applied statistical experimental design concepts to the study of the interaction of ion implantation with remote‐plasma photoresist ashing. A 28–4IV fractional‐factorial screening experiment revealed that implant species and resist hard bake conditions were not significant factors for resist ash rate and uniformity. We obtained quadratic polynomial response surface models using a G‐optimal experimental design as a function of the remaining four ash variables (temperature, pressure, oxygen, and hydrogen mass flow rates) and two implant factors (implant dose and energy). Ion implant dose had a significant effect on ash rate while implant energy was an important factor for ash rate uniformity.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::1df1f65b99c2a831e5390357139c9c6b https://doi.org/10.1116/1.577556 Zobrazit plný text záznamu