Reliability benefits of a metallic liner in confined PCM
| Autor: | Robert L. Bruce, Yu Zhu, Sangbum Kim, Asit Kumar Ray, Wanki Kim, G. Fraczak, Judy J. Cha, T. Masuda, C. Lam, Matthew J. BrightSky, Fabio Carta, Yujun Xie, K. Suu, Y. Kim |
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| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Void (astronomy) Materials science 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences Metal Phase-change memory Electrical resistivity and conductivity Transmission electron microscopy visual_art 0103 physical sciences visual_art.visual_art_medium Composite material 0210 nano-technology Electronic circuit |
| Zdroj: | IRPS |
| DOI: | 10.1109/irps.2018.8353636 |
| Popis: | We demonstrate outstanding resistance-drift (R-drift) mitigation and void elimination as reliability benefits of a thin metallic liner. By tuning the resistivity of the liner, the confined PCM with a metallic liner yields an extremely low R-drift coefficient (∼0.01). We also show for the first time that confined PCM could have a self-recovering property by incorporating a metallic liner. The experimental results with real-time in-situ transmission electron microscope (TEM) exhibit the robustness of the confined PCM that can recover by itself without any extra circuits. |
| Databáze: | OpenAIRE |
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