Quantitative Analysis of Negative Bias Illumination Stress-Induced Instability Mechanisms in Amorphous InGaZnO Thin-Film Transistors

Autor:	Hwan Kim Dae, Kim Woojoon, Kong Dongsik, Hur Inseok, Kwnag Jung Hyun, Bae Min-Kyung, Myong Kim Dong, Kim Jeahyeong, Kim Yongsik
Rok vydání:	2011
Předmět:	Materials science Thin-film transistor business.industry Stress induced General Physics and Astronomy Optoelectronics Negative bias business Quantitative analysis (chemistry) Instability Amorphous solid
Zdroj:	Journal of the Korean Physical Society. 59:474-477
ISSN:	0374-4884
DOI:	10.3938/jkps.59.474
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::1dcfb3095d369a14d4b46cb1cb58b33f https://doi.org/10.3938/jkps.59.474 Zobrazit plný text záznamu