Effect of plasma nitriding on the strength of fine protrusions formed by sputter etching of AISI type 420 stainless steel

Autor: Rongguang Wang, Akihiro Yamamoto, Keijiro Nakasa, Tsunetaka Sumomogi
Rok vydání: 2015
Předmět:
Zdroj: Surface and Coatings Technology. 272:298-308
ISSN: 0257-8972
DOI: 10.1016/j.surfcoat.2015.03.048
Popis: Argon ion sputter-etching of AISI type 420 martensitic stainless steel was carried out to form conical protrusions with bottom diameter of 10–30 μm on the specimen surface by using a radio-frequency magnetron sputter-apparatus. Plasma-nitriding was applied to the protrusions with various mixing rate of nitrogen and argon gas. The shape of the protrusions was examined by using a scanning electron microscope, and the nitrides formed on the protrusions were identified by means of an X-ray diffraction analysis. Micro-Vickers hardness tests and nano-scratch tests were used to evaluate the deformation resistance of the protrusions. By plasma-nitriding at a nitrogen pressure of 130 Pa and a nitriding power of 50 W, about 1.3 times larger indentation resistance than that of the as-sputter-etched protrusions was obtained after a long nitriding time of 14 ks. When plasma-nitriding was carried out at a lower nitrogen pressure of 1.2 Pa and a higher nitriding power of 200 W for 7.2 ks, indentation and scratch resistances of the protrusions largely increased to the values almost three times as large as those of the as-sputter-etched protrusions. However, the protrusions were brittle due to the formation of thick nitride layers and the sharpness of the protrusions was lost. Reduction of the nitriding power to 50 W recovered the sharpness with small amount of surface nitride layer, but the indentation resistances were only 1.4 times larger values than those of the as-sputter-etched protrusions. On the other hand, plasma-nitriding using a mixture of nitrogen gas of 0.53 Pa and argon gas of 0.67 Pa at the power of 50 W produced almost twice larger indentation and scratch resistances than those of the as-sputter-etched protrusions within a short nitriding time of 1.8 ks, retaining the sharpness of protrusions without forming brittle nitrided layers.
Databáze: OpenAIRE