A far-ultraviolet contamination-irradiation facility for in situ reflectance measurements

Autor:	June L. Tveekrem, Steven R. Meier, Ritva A. M. Keski-Kuha
Rok vydání:	1998
Předmět:	In situ Aerospace testing Optics business.industry Optical testing Far ultraviolet Environmental science Irradiation Contamination business Instrumentation Reflectivity Remote sensing
Zdroj:	Review of Scientific Instruments. 69:3642-3644
ISSN:	1089-7623 0034-6748
DOI:	10.1063/1.1149152
Popis:	In this article, a contamination-irradiation facility designed to measure contamination effects on far-ultraviolet optical surfaces is described. An innovative feature of the facility is the capability of depositing a contaminant, photopolymerizing the contaminant with far-ultraviolet light, and measuring the reflectance of the contaminated sample, all in situ. In addition to describing the facility, we present far-ultraviolet reflectance measurements for a contaminated mirror.
Databáze:	OpenAIRE
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