Effects of O2 Plasma Treatment on the Reliabilities of Metal Gate/High-k Dielectric MOSFETs

Autor:	Lee Byoung Hun, Rino Choi, Song Seung Chul, Lee Kyong Taek, Lee Hi-Deok, Kang Chang Yong, Jeong Yoon-Ha
Rok vydání:	2007
Předmět:	Materials science business.industry Optoelectronics Plasma treatment business Metal gate High-κ dielectric
Zdroj:	Extended Abstracts of the 2007 International Conference on Solid State Devices and Materials.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::1d27d2ff946c8f8ace4589032a49ab4b https://doi.org/10.7567/ssdm.2007.a-6-1 Zobrazit plný text záznamu